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Nanofabrication is a broad field of study. Nanotechnology has witnessed a rapid expansion in the past few years, mainly owing to the speedy development in nanofabrication methods employed to manufacture nano-devices. Nanofabrication can be divided into two portions: methods using chemical combination and methods using nanolithography. This book contains various chapters and aims to offer the essential and current developments of nanolithography. It covers various aspects related to electron and ion beam, nanoimprint, interference, two-photon, UV and X-ray lithography. Most chapters analyze the lithographic procedures available for researchers and experts. This book covers the subject thoroughly and will be beneficial for its readers.