The development of advanced materials with preselected properties is one of the main goals of materials research. Of especial interest are electronics, high-temperature and supemard materials for various applications, as well as alloys with improved wear, corrosion and mechanical resistance properties. The technical challenge connected with the production of these materials is not only associated with the development of new specialised preparation techniques but also with quality control. The energetic charged particle, electron and photon beams offer the possibility of modifying the…mehr
The development of advanced materials with preselected properties is one of the main goals of materials research. Of especial interest are electronics, high-temperature and supemard materials for various applications, as well as alloys with improved wear, corrosion and mechanical resistance properties. The technical challenge connected with the production of these materials is not only associated with the development of new specialised preparation techniques but also with quality control. The energetic charged particle, electron and photon beams offer the possibility of modifying the properties of the near-surface regions of materials without seriously affecting their bulk, and provide unique analytical tools for testing their qUality. This volume includes most of the lectures and contributions delivered at the NATO-funded Advanced Study Institute "Application of Particle and Laser Beams in Materials Technology", which was held in Kallithea, Chalkidiki, in Northern Greece, from the 8th to the 21st of May, 1994 and attended by 73 participants from 21 countries. The aim of this ASI was to provide to the participants an overview of this rapidly expanding field. Fundamental aspects concerning the interactions and collisions on atomic, nuclear and solid state scale were presented in a didactic way, along with the application of a variety of techniques for the solution of problems ranging from the development of electronics materials to corrosion research and from archaeometry to environmental protection.Hinweis: Dieser Artikel kann nur an eine deutsche Lieferadresse ausgeliefert werden.
I. Fundamentals.- Fundamental Aspects of Ion Electron Interactions.- Fundamentals of Ion-Solid Interactions: Atomic Collisions.- Excitation and Ionization In Fast Ion-Atom Collisions Due To Projectile-Electron - Target-Electron Interactions.- Radiation Induced Point Defects and Diffusion.- High Temperature Oxidation and Corrosion of Metals and Alloys: Fundamentals and Influence of High Energy Beams.- Thin Films of High-Temperature Superconductors: Application-Oriented Studies of Growth and Properties.- II. Surface Analysis Techniques.- An Overview of Surface Analysis. Application to the Adsorption of Li on Single Crystals of Layered Compounds.- Depth Profiling in Combination with Sputtering.- A SIMS Study of the Inter-Diffusion of Group III Atoms in a Distributed Bragg Reflector.- Thermal He-Atom Scattering for the Study of Surface Systems: K on Si(001).- Experimental and Monte-Carlo Simulation Studies of the Surface Concentration Changes in ZrO2 under Ion Bombardment.- Ion-Induced Photon Emission of Materials and Possibilities of its Application for Surface Diagnostics.- III. Laser Beams in Materials Technology.- The Raman Approach to Materials Science.- Laser-Material Interaction. Plasma Formation and Applications.- Optical Spectrometry Coupled with Laser Ablation for Analytical Applications on Solids.- In Situ Laser Beam Probes for Semiconductor Processing.- Laser Deposition and Patterning of Diamond Films.- Laser-Raman Spectroscopy of Some Lanthanide/Hgl2 Heterometallic Complexes (HL=5,7-Dimethyl-1,8-Naphthyridine-2-OL).- IV. Accelerator-Based Techniques in Materials Technology.- Accelerators in Materials Research.- Application of Elastic Recoil Detection in Materials Analysis.- Applications of High Energy Ion Scattering in Materials Science.- High Energy HeavyIon RBS, ERDA and Channelling.- Some New Detection Techniques for Light-Ion Scattering Analysis.- Prompt Gamma-Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and Na.- Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation Analysis.- Thin Layer Activation in Materials Technology.- Optimum Industrial Application of the Thin Layer Activation Technique.- Ion Beam Analysis of Glasses - Industrial Applications.- Nuclear Reaction Analysis of Corroded Glass Surfaces.- Ion-Beam Archaeometry: Technological Assessment of Ancient and Medieval Materials.- Non-Destructive Analysis Of American Gold Jewellery Items By PIXE, RBS and PIGE.- Recoil Spectrometry: A Suitable Method for Studying Interfacial Reactions in Metal-InP Systems.- Bismuth-Implanted Silicon Reference Material Revisited: The Concept of Traceability and the Individual Characterisation of Chips.- Energy Dispersive X-Ray Analysis of the Tin Distribution on Electrolytically Coloured Anodised Aluminium.- Determination of Sulphur and Copper Distribution on Chemically Modified HEU-Type Zeolite Crystals by Means of Nuclear Resonant Reaction Analysis Techniques, Scanning Electron Microscopy and X-Ray Fluorescence.- Modern Technological Projects with High Power Electron Beams.- Computer-Aided Design of Technological Electron-Optical Systems.- Ion Beam Mixing.- Materials Modification Using Electron Beams.- Deposition and Etching Mechanisms in Plasma Thin Film Processes.- Active Modification and Amorphisation of Materials by Low-Energy Ion Irradiation.- SIMOX Thin Films. Structural and Electrical Characterisation using FTIR Spectroscopy.- The Key Role of Electron Beams in IC Technology.- Cadmium Sulphide Microcrystallite-Doped Silicon Dioxide Thin FilmsPrepared by RF-Sputtering: Growth and Physical Characterisation.- VI. Synchrotron Radiation.- Synchrotron Radiation Sources for Materials Technology.- Photoemission and EXAFS Study of Na on 2H-TaS2.- Characterisation of Nearly Stoichiometric Buried SixNy Films with EXAFS and NEXAFS.- List of Contributors.- List of Participants.
I. Fundamentals.- Fundamental Aspects of Ion Electron Interactions.- Fundamentals of Ion-Solid Interactions: Atomic Collisions.- Excitation and Ionization In Fast Ion-Atom Collisions Due To Projectile-Electron - Target-Electron Interactions.- Radiation Induced Point Defects and Diffusion.- High Temperature Oxidation and Corrosion of Metals and Alloys: Fundamentals and Influence of High Energy Beams.- Thin Films of High-Temperature Superconductors: Application-Oriented Studies of Growth and Properties.- II. Surface Analysis Techniques.- An Overview of Surface Analysis. Application to the Adsorption of Li on Single Crystals of Layered Compounds.- Depth Profiling in Combination with Sputtering.- A SIMS Study of the Inter-Diffusion of Group III Atoms in a Distributed Bragg Reflector.- Thermal He-Atom Scattering for the Study of Surface Systems: K on Si(001).- Experimental and Monte-Carlo Simulation Studies of the Surface Concentration Changes in ZrO2 under Ion Bombardment.- Ion-Induced Photon Emission of Materials and Possibilities of its Application for Surface Diagnostics.- III. Laser Beams in Materials Technology.- The Raman Approach to Materials Science.- Laser-Material Interaction. Plasma Formation and Applications.- Optical Spectrometry Coupled with Laser Ablation for Analytical Applications on Solids.- In Situ Laser Beam Probes for Semiconductor Processing.- Laser Deposition and Patterning of Diamond Films.- Laser-Raman Spectroscopy of Some Lanthanide/Hgl2 Heterometallic Complexes (HL=5,7-Dimethyl-1,8-Naphthyridine-2-OL).- IV. Accelerator-Based Techniques in Materials Technology.- Accelerators in Materials Research.- Application of Elastic Recoil Detection in Materials Analysis.- Applications of High Energy Ion Scattering in Materials Science.- High Energy HeavyIon RBS, ERDA and Channelling.- Some New Detection Techniques for Light-Ion Scattering Analysis.- Prompt Gamma-Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and Na.- Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation Analysis.- Thin Layer Activation in Materials Technology.- Optimum Industrial Application of the Thin Layer Activation Technique.- Ion Beam Analysis of Glasses - Industrial Applications.- Nuclear Reaction Analysis of Corroded Glass Surfaces.- Ion-Beam Archaeometry: Technological Assessment of Ancient and Medieval Materials.- Non-Destructive Analysis Of American Gold Jewellery Items By PIXE, RBS and PIGE.- Recoil Spectrometry: A Suitable Method for Studying Interfacial Reactions in Metal-InP Systems.- Bismuth-Implanted Silicon Reference Material Revisited: The Concept of Traceability and the Individual Characterisation of Chips.- Energy Dispersive X-Ray Analysis of the Tin Distribution on Electrolytically Coloured Anodised Aluminium.- Determination of Sulphur and Copper Distribution on Chemically Modified HEU-Type Zeolite Crystals by Means of Nuclear Resonant Reaction Analysis Techniques, Scanning Electron Microscopy and X-Ray Fluorescence.- Modern Technological Projects with High Power Electron Beams.- Computer-Aided Design of Technological Electron-Optical Systems.- Ion Beam Mixing.- Materials Modification Using Electron Beams.- Deposition and Etching Mechanisms in Plasma Thin Film Processes.- Active Modification and Amorphisation of Materials by Low-Energy Ion Irradiation.- SIMOX Thin Films. Structural and Electrical Characterisation using FTIR Spectroscopy.- The Key Role of Electron Beams in IC Technology.- Cadmium Sulphide Microcrystallite-Doped Silicon Dioxide Thin FilmsPrepared by RF-Sputtering: Growth and Physical Characterisation.- VI. Synchrotron Radiation.- Synchrotron Radiation Sources for Materials Technology.- Photoemission and EXAFS Study of Na on 2H-TaS2.- Characterisation of Nearly Stoichiometric Buried SixNy Films with EXAFS and NEXAFS.- List of Contributors.- List of Participants.
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