Deposition of Copper Oxide Thin Films by Chemical Techniques - Muhibbullah, Muhammad
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Thin films deposition techniques have been described in the book especially chemical deposition methods. Copper oxide thin films deposition using chemical spray pyrolysis, chemical bath and drop-chemical deposition techniques, and characterization such as compositional by AES, structural by XRD, morphological by SEM, electrical, optical by UViR double beam spectrometer, photo-electrochemical and current-voltage analyses have been described. Also CdS thin film of spray pyrolysis deposition and ZnO thin film of electrochemical deposition methods have been described shortly. The characterizations…mehr

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Produktbeschreibung
Thin films deposition techniques have been described in the book especially chemical deposition methods. Copper oxide thin films deposition using chemical spray pyrolysis, chemical bath and drop-chemical deposition techniques, and characterization such as compositional by AES, structural by XRD, morphological by SEM, electrical, optical by UViR double beam spectrometer, photo-electrochemical and current-voltage analyses have been described. Also CdS thin film of spray pyrolysis deposition and ZnO thin film of electrochemical deposition methods have been described shortly. The characterizations of the CuO-CdS heterojunction for rectification and the characterization of the Cu2O-ZnO heterojunction for rectification and solar cell application have been described.
Autorenporträt
Dr Muhammad Muhibbullah has been graduated from Rajshahi University, Bangladesh on Physics (1994). He has awarded M. Phil. (2002) and Doctor of Engg. (2012) degrees from Rajshahi University, Bangladesh and Nagoya Institute of Technology, Japan respectively. Now he is an Asst. Professor in the Dept. of EEE of Bangladesh University, Dhaka, Bangladesh