Developments in Surface Contamination and Cleaning, Vol. 1

Fundamentals and Applied Aspects
Herausgegeben:Kohli, Rajiv; Mittal, Kashmiri L.

• Gebundenes Buch

Produktbeschreibung

Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation.

Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination.

In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants.

The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.

Produktdetails

• Verlag: Elsevier Science & Technology / William Andrew
• Artikelnr. des Verlages: C2013-0-19237-9
• 2. Aufl.
• Englisch
• Abmessung: 44mm x 152mm x 229mm
• Gewicht: 1520g
• ISBN-13: 9780323299602
• Artikelnr.: 43581339

Inhaltsangabe

Part 1 Fundamentals 1. The Physical Nature of Very, Very Small Particles and its Impact on their Behaviour 2. Transport and Deposition of Aerosol Particles 3. Relevance of Particle Transport in Surface Deposition and Cleaning 4. Aspects of Particle Adhesion and Removal 5. Tribological Implications of Particles 6. ESD Controls in Cleanroom Environments: Relevance to Particle Deposition 7. Airborne Molecular Contamination: Contamination on Substrates and Environments in Semiconductors and Other Industries

Part 2 Characterization 8. Surface Analysis Methods for Contaminant Identification 9. Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles 10. Wettability Techniques to Monitor the Cleanliness of Surfaces

Part 3 Techniques for Removal of Surface Contamination 11. Cleaning with Solvents Durkee Reprint 12. Removal of Particles by Chemical Cleaning 13. The Use of Surfactants to Enhance Particle Removal from Surfaces 14. Microabrasive Precision Cleaning and Processing Technology 15. Cleaning Using High-Speed Impinging Jet 16. Carbon Dioxide Snow Cleaning Sherman Update 17. Cleaning Using Argon/Nitrogen Cryogenic Aerosols 18. Coatings for Preventing or Deactivation of Biological Contaminants 19. A Detailed Study of Semiconductor Wafer Drying

Rezensionen

"Although most valuable as background reading rather than day-to-day troubleshooting, this book is highly recommended. It will stimulate readers to review cleaning practices in their own organisations and provide ideas as to how these might be improved." --Galvanotechnik