Dielectric properties of thin tantalum and niobium oxide layers - Abuetwirat, Inas
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Dielectric relaxation spectroscopy is one of the useful methods in studying the molecular dynamics of materials. Owing to recent developments in instrumentation and advances in measurement technique, it is possible to obtain the dispersion of dielectric permittivity in a wide frequency range and for very different materials. This book investigates dielectric relaxation spectra and conductivity of oxides of niobium, tantalum for field emission cathodes. Frequency and temperature behaviour of these oxides are analysed, as well as their conductivity over a wide frequency and temperature range, to…mehr

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Produktbeschreibung
Dielectric relaxation spectroscopy is one of the useful methods in studying the molecular dynamics of materials. Owing to recent developments in instrumentation and advances in measurement technique, it is possible to obtain the dispersion of dielectric permittivity in a wide frequency range and for very different materials. This book investigates dielectric relaxation spectra and conductivity of oxides of niobium, tantalum for field emission cathodes. Frequency and temperature behaviour of these oxides are analysed, as well as their conductivity over a wide frequency and temperature range, to attempt and determine the origin of the relaxation. As the original range of oxides has been very broad, also with regard to their application in electrolytic capacitors. The author would like to express her special thanks to Dr. Karel Liedermann and Prof. Peter Lunkenheimer for their help and guidance in completing her research.
Autorenporträt
Dr. Inas Faisel Abuetwirat has obtained her Ph.D. in physics and nanotechnology at Brno University of Technology. She is the author of several articles presented at international conferences and published in reputed journals. Her particular fields of interest are dielectric properties of oxides of niobium, and tantalum for field emission cathodes.