Efficient Extreme Ultraviolet Mirror Design - Lee, Yen-Min
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Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. It is an essential reference for EUV industry professionals.

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Produktbeschreibung
Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. It is an essential reference for EUV industry professionals.
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Autorenporträt
Dr Yen-Min Lee obtained his PhD from the National Taiwan University (Taipei, Taiwan) before joining ASML Holding as a mechatronics engineer in their motion design group in the USA. He went on to join the optical design group at Eindhoven and served as a senior physics engineer in the optical metrology group (Linkou, Taiwan). His research interests include computational lithography, large-scale electromagnetic problems, parallel computing, inverse algorithms, optical metrology, and medical imaging.