EUVL is an area of intense research and this book provides the foundation required for understanding and applying this technology. It offers contributions from the world's leading EUVL researchers, and provides all the critical information needed by practitioners and those wanting to enter the field.
EUVL is an area of intense research and this book provides the foundation required for understanding and applying this technology. It offers contributions from the world's leading EUVL researchers, and provides all the critical information needed by practitioners and those wanting to enter the field.Hinweis: Dieser Artikel kann nur an eine deutsche Lieferadresse ausgeliefert werden.
Vivek Bakshi is the President of EUV Litho, Inc. He was previously a senior member of the technical staff of Sematech, Inc. Dr. Bakshi studied at the University of Texas at Austin; the University of Idaho; and the Indian Institute of Technology at Kanpur.
Inhaltsangabe
1. EUV Lithography: A Historical Perspective / Hiroo Kinoshita and Obert Wood 2. EUV LLC: An Historical Perspective / Chuck Gwyn and Stefan Wurm 3. EUV Source Technology / Vivek Bakshi 4A. Optics and Multilayer Coatings for EUVL Systems / Regina Soufli, Sas a Bajt, Russell M. Hudyma and John S. Taylor 4B. Projection Systems for Extreme Ultraviolet Lithography / Russell M. Hudyma and Regina Soufli 4C. Specification, Fabrication, Testing, and Mounting of EUVL Optical Substrates / John S. Taylor and Regina Soufli 4D. Multilayer Coatings for EUVL / Regina Soufli and Sas a Bajt 5. EUV Optical Testing / Kenneth A. Goldberg 6A. Optics Contamination / Sas a Bajt 6B. Grazing Angle Collector Contamination / Valentino Rigato 6C. Normal Incidence (Multilayer) Collector Contamination / David N. Ruzic and Shailendra N. Srivastava 7. EUV Mask and Mask Metrology / Han-Ku Cho and Jinho Ahn 8. Photoresists for Extreme Ultraviolet Lithography / Robert L. Brainard 9. High-Resolution EUV Imaging Tools for Resist Exposure and Aerial Image Monitoring / Malcolm Gower 10. Fundamentals of the EUVL Scanner / Kazuya Ota 11. EUVL System Patterning Performance / Patrick Naulleau, John E. Bjorkholm, and Manish Chandhok 12. Lithography Cost of Ownership / Phil Seidel Appendix: Example Case Studies of Lithography CoO Calculations
1. EUV Lithography: A Historical Perspective / Hiroo Kinoshita and Obert Wood 2. EUV LLC: An Historical Perspective / Chuck Gwyn and Stefan Wurm 3. EUV Source Technology / Vivek Bakshi 4A. Optics and Multilayer Coatings for EUVL Systems / Regina Soufli, Sas a Bajt, Russell M. Hudyma and John S. Taylor 4B. Projection Systems for Extreme Ultraviolet Lithography / Russell M. Hudyma and Regina Soufli 4C. Specification, Fabrication, Testing, and Mounting of EUVL Optical Substrates / John S. Taylor and Regina Soufli 4D. Multilayer Coatings for EUVL / Regina Soufli and Sas a Bajt 5. EUV Optical Testing / Kenneth A. Goldberg 6A. Optics Contamination / Sas a Bajt 6B. Grazing Angle Collector Contamination / Valentino Rigato 6C. Normal Incidence (Multilayer) Collector Contamination / David N. Ruzic and Shailendra N. Srivastava 7. EUV Mask and Mask Metrology / Han-Ku Cho and Jinho Ahn 8. Photoresists for Extreme Ultraviolet Lithography / Robert L. Brainard 9. High-Resolution EUV Imaging Tools for Resist Exposure and Aerial Image Monitoring / Malcolm Gower 10. Fundamentals of the EUVL Scanner / Kazuya Ota 11. EUVL System Patterning Performance / Patrick Naulleau, John E. Bjorkholm, and Manish Chandhok 12. Lithography Cost of Ownership / Phil Seidel Appendix: Example Case Studies of Lithography CoO Calculations
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