Frontiers in Optical Methods

Nano-Characterization and Coherent Control
Herausgegeben:Shudo, Ken-ichi; Katayama, Ikufumui; Ohno, Shin-Ya

• Gebundenes Buch

Produktbeschreibung

This collection of reviews by leading Japanese researchers covers topics like ultrafast optical responses, terahertz and phonon studies, super-sensitive surface and high-pressure spectroscopy, combination of visible and x-ray photonics. Several related areas at the cutting edge of measurement technology and materials science are included. This book is partly based on well-cited review articles in the Japanese language in special volumes of the Journal of the Vacuum Society of Japan.

Produktdetails

• Springer Series in Optical Sciences 180
• Verlag: Springer / Springer Berlin Heidelberg / Springer, Berlin
• Artikelnr. des Verlages: 80031989, 978-3-642-40593-8
• 2014
• Seitenzahl: 240
• Erscheinungstermin: 17. Dezember 2013
• Englisch
• Abmessung: 241mm x 160mm x 19mm
• Gewicht: 518g
• ISBN-13: 9783642405938
• ISBN-10: 3642405932
• Artikelnr.: 39195382

Inhaltsangabe

State-of-Art of Terahertz Science and Technology.- Broadband Terahertz Spectroscopy and its Application to the Characterization of Thin Films.- Single Photon Counting and Passive Microscopy of Terahertz Radiation.- Coherent Phonons in Carbon Nanotubes.- Time-resolved X-ray Diffraction Studies of Coherent Lattice Dynamics Using Synchrotron Radiation.- Imaging GHz-THz Acoustic Wave Propagation in Thin Films and Microstructures.- Material Evaluation with Various Optical Measurement Systems: Focusing on Terahertz Spectroscopy.- Ultrafast Excitation and Dynamics Measurements with Intense Ultrashort Laser Pulses: High-Order Harmonic Generation from Aligning Molecules and Surface Nanostructuring.- Real Space Mapping of Exciton Interaction Strength in GaN Films by using Four-Wave-Mixing Technique.- Terahertz Light Source Based on Synchrotron Radiation.- Terahertz Synchrotron Radiation; Optics and Application.- Far-infrared Spectroscopy on Solids under Ultra High Pressures.- Real-time Analysis of Initial Oxidation Process on Si(001) by Means of Surface Differential Reflectance Spectroscopy and Reflectance Difference Spectroscopy.