Fundamentals of Nanoscale Film Analysis - Alford, Terry L;Feldman, L.C.;Mayer, James W.
74,99 €
inkl. MwSt.
Versandkostenfrei*
Versandfertig in 6-10 Tagen
payback
37 °P sammeln
  • Gebundenes Buch

Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Fundamentals of Nanoscale Film Analysis concentrates on analysis of the structure and composition of the surface and the outer few tens to hundred nanometers in depth. It describes characterization techniques to quantify the structure, composition and depth distribution of materials with the use of energetic particles and photons.
The book describes the…mehr

Andere Kunden interessierten sich auch für
Produktbeschreibung
Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Fundamentals of Nanoscale Film Analysis concentrates on analysis of the structure and composition of the surface and the outer few tens to hundred nanometers in depth. It describes characterization techniques to quantify the structure, composition and depth distribution of materials with the use of energetic particles and photons.

The book describes the fundamentals of materials characterization from the standpoint of the incident photons or particles which interrogate nanoscale structures. These induced reactions lead to the emission of a variety of detected of particles and photons. It is the energy and intensity of the detected beams that is the basis of the characterization of the materials. The array of experimental techniques used in nanoscale materials analysis covers a wide range of incident particle and detected beam interactions.

Included are such important interactions as atomic collisions, Rutherford backscattering, ion channeling, diffraction, photon absorption, radiative and nonradiative transitions, and nuclear reactions. A variety of analytical and scanning probe microscopy techniques are presented in detail.
Autorenporträt
Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. This book focuses on the fundamental physics underlying the techniques used to analyze the nature of surfaces and near-surfaces in the properties of materials. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Coverage includes new analytical techniques, such as x-ray fluorescence (XRF) in thin film analysis. This volume updates (with a nano focus) the well regarded 1986 book, Surface and Thin Film Analysis, by Feldman and Mayer.