Andere Kunden interessierten sich auch für
![Nanostructured Thin Films]( "Nanostructured Thin Films")
Nanostructured Thin Films44,99 €![Zone Melting]( "Zone Melting")
Zone Melting22,99 €![Preparation and evaluation of novel drug alginate granule systems]( "Preparation and evaluation of novel drug alginate granule systems")
Preparation and evaluation of novel drug alginate granule systems51,99 €![The Source/Drain Engineering of Nanoscale Germanium-based MOS Devices]( "The Source/Drain Engineering of Nanoscale Germanium-based MOS Devices")
The Source/Drain Engineering of Nanoscale Germanium-based MOS Devices37,99 €![Canned Fruit, Preserves, and Jellies: Household Methods of Preparation U.S. Department of Agriculture Farmers' Bulletin No. 203]( "Canned Fruit, Preserves, and Jellies: Household Methods of Preparation U.S. Department of Agriculture Farmers' Bulletin No. 203")
Canned Fruit, Preserves, and Jellies: Household Methods of Preparation U.S. Department of Agriculture Farmers' Bulletin No. 2038,90 €![Analysis and Design of MOSFETs]( "Analysis and Design of MOSFETs")
Analysis and Design of MOSFETs110,99 €![Teachers¿ Perspectives, Preparation and Practices in the Digital Era]( "Teachers¿ Perspectives, Preparation and Practices in the Digital Era")
Teachers¿ Perspectives, Preparation and Practices in the Digital Era32,99 €
Germanium is gaining interest in the semiconductorindustry as a replacement channel material for highmobility applications. Contamination directlyaffects the device performance, yield andreliability. Therefore, continued device scaling isdependent on effective surface preparation includingeffective contamination and particle removal ofgermanium surface. Cleaning and preparation methodsfor silicon surface have been extensively developedover the past few decades. Germanium surfacecleaning and preparation is at its infancy and ismarkedly different from that of silicon. This bookexamines these differences and fundamentals involvedin germanium surface cleaning. This book alsoproposes methods for basic germanium surfacecleaning and the basis for further processdevelopment for professionals involved in surfacecleaning of semiconductor materials.