Harassment at Work: Emotional Consequences - Lopez Reyes, Maria Kenya
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Harassment at work is a common occurrence in organisational environments and should be studied as it has a negative psychological, social, emotional and occupational impact on workers. In the present study, interviews were conducted with harassed women in a government institution in the state of Puebla to identify the emotional consequences they suffer. The results show that there are emotional consequences that leave irreparable psychological damage in the harassed person, such as fear, insecurity, predisposition to harassment and the appearance of various psychosomatic illnesses. Given that…mehr

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Produktbeschreibung
Harassment at work is a common occurrence in organisational environments and should be studied as it has a negative psychological, social, emotional and occupational impact on workers. In the present study, interviews were conducted with harassed women in a government institution in the state of Puebla to identify the emotional consequences they suffer. The results show that there are emotional consequences that leave irreparable psychological damage in the harassed person, such as fear, insecurity, predisposition to harassment and the appearance of various psychosomatic illnesses. Given that harassment at work is already considered a serious problem and present in our society, it is necessary for the professional immersed in organisations to be prepared to be able to detect the problem and offer the victims comprehensive solutions and programmes in order to strengthen healthy relationships in organisational environments.
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Autorenporträt
María Kenya López Reyes. Née en 1982 à Puebla, au Mexique. Elle a étudié la psychologie et obtenu un master en psychologie du travail et des organisations. Elle a été spécialiste du recrutement, de la sélection et de la formation dans des institutions publiques et privées. Elle est actuellement consultante, conférencière et chercheuse sur les questions de climat de travail dans son pays de résidence.