III-Nitride Optoelectronic Materials and Devices

III-Nitride Optoelectronic Materials and Devices

Characterization, Metal-semiconductor- metal Photodetectors MSM PD, Solar cells, and Multi-Quantum well laser diodes LDs

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The objective of this book is to characterize the optoelectronic properties of quaternary n-Al0.08In0.08Ga0.84N thin films grown via plasma assistance molecular beam epitaxy on sapphire (Al2O3) and silicon (Si) substrates for different optoelectronic applications, including Al0.08In0.08Ga0.84N (MSM) photodetectors (PDs), solar cells and multi-quantum well (MQW) laser diodes (LDs). Defect-free films with high structural, optical and electrical qualities were obtained. X-ray diffraction analysis was used to characterize small full width at half maximum intensity of diffraction peaks, low compres...