This is the first-ever book on the preparation, atomic-level description, and chemistry of ultrathin silica films grown on metal substrates. Silica is one of the key materials in many modern technological applications.
This is the first-ever book on the preparation, atomic-level description, and chemistry of ultrathin silica films grown on metal substrates. Silica is one of the key materials in many modern technological applications.
Shamil Shaikhutdinov received his PhD in physics in 1986 from the Moscow Institute of Physics and Technology for the study of microwave dielectric properties of inorganic materials. Then he joined the Boreskov Institute of Catalysis at Novosibirsk to carry out "surface science" studies of catalytic systems, in particular with scanning tunneling microscopy. Since 2004, he is leading the "Structure and Reactivity" group at the Fritz-Haber Institute at Berlin. His research interests focus on the fundamental understanding of atomic structures and surface chemistry of functional materials based on ultrathin films.
Inhaltsangabe
1. Silica and Silicates 2. Preparation of Thin Oxide Films: Concepts and Toolkits 3. Thin Silica Films on Si and SiC 4. Ultrathin Silica Films on Metals 5. Defects in Ultrathin Silica Films on Metals 6. Ultrathin Films of (Al, Fe, Ti)-Silicates 7. Adsorption on Ultrathin Silicate Films: Surface and "Sub-Surface" Reactions 8. Water Adsorption on Silica Films 9. Silicatene una Graphene
1. Silica and Silicates 2. Preparation of Thin Oxide Films: Concepts and Toolkits 3. Thin Silica Films on Si and SiC 4. Ultrathin Silica Films on Metals 5. Defects in Ultrathin Silica Films on Metals 6. Ultrathin Films of (Al, Fe, Ti)-Silicates 7. Adsorption on Ultrathin Silicate Films: Surface and "Sub-Surface" Reactions 8. Water Adsorption on Silica Films 9. Silicatene una Graphene
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