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The present book indicated the ability of isolated R3 strain in degrading high-strength phenol.The strains isolated were designated as R1,R2,R3,R4,R5 and R6. One of the strains namely R3 was found to be highly effective for the removal of phenol. The effect of contact time, phenol concentration temperature and pH and on the rate of phenol degradation by that particular strain was carried out. Observations revealed that the rate of phenol biodegradation was significantly affected by contact time, temperature of incubation and phenol concentration. The optimal conditions for phenol removal were…mehr

Produktbeschreibung
The present book indicated the ability of isolated R3 strain in degrading high-strength phenol.The strains isolated were designated as R1,R2,R3,R4,R5 and R6. One of the strains namely R3 was found to be highly effective for the removal of phenol. The effect of contact time, phenol concentration temperature and pH and on the rate of phenol degradation by that particular strain was carried out. Observations revealed that the rate of phenol biodegradation was significantly affected by contact time, temperature of incubation and phenol concentration. The optimal conditions for phenol removal were found to be pH of 8, temperature of 36°C, contact time of 96 hrs and concentration of phenol of 200 ppm.Box Behnken Design was used to optimize the process of phenol degradation by R3 strain, isolated from textile effluent. The results of RSM-BB method showed the significant effect of temperature, contact time and concentration on phenol removal from aqueous solution. The predicted results showed that the maximum removal efficiency of phenol (91%).
Autorenporträt
Ich M.Ranjitha persuing M.Tech Biotechnologie, Andhra University College of Engineering (A).Mein Projekt Bereich umfasst biologischen Abbau.Ich veröffentlichte eine Arbeit in einem renommierten inernationalen Zeitschrift und mein Papier für elsevier Konferenz ausgewählt.Ich wurde in Dr. Surapaneni genomischen Lösungen, Hyderabad unter der Unterstützung von BCIL, Delhi ausgebildet.