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Porous silicon (PS) is very important due to its applications in optoelectronics, biological and chemical sensors, micromachining, in fabrication of diffusion membranes and as a substrate material and trap for molecules in matrix-free desorption/ionization mass spectrometry. PS can also be used in photovoltaics, biomedical applications, and in batteries and solar cells. PS is normally produced either by anodic etching in HF-based solutions or by stain etching in HF/oxidizing agent. While Metal-assisted chemical etching method does not need external bias and enables formation of uniform PSL more rapidly than the stain etching method.…mehr

Produktbeschreibung
Porous silicon (PS) is very important due to its applications in optoelectronics, biological and chemical sensors, micromachining, in fabrication of diffusion membranes and as a substrate material and trap for molecules in matrix-free desorption/ionization mass spectrometry. PS can also be used in photovoltaics, biomedical applications, and in batteries and solar cells. PS is normally produced either by anodic etching in HF-based solutions or by stain etching in HF/oxidizing agent. While Metal-assisted chemical etching method does not need external bias and enables formation of uniform PSL more rapidly than the stain etching method.
Autorenporträt
Awad Mogoda, PhD of physical chemistry from Cairo University in 1986. Prof. of physical chemistry at Cairo University. He interested in the studies of corrosion of metals and alloys, preparation of thin anodic oxide films, superconductors and porous silicon.