Materials and Technology for Nonvolatile Memories
Herausgeber: Dimitrakis, Panagiotis; Tokumitsu, Eisuke; Hu, Guohan; Fujisaki, Yoshihisa
Materials and Technology for Nonvolatile Memories
Herausgeber: Dimitrakis, Panagiotis; Tokumitsu, Eisuke; Hu, Guohan; Fujisaki, Yoshihisa
- Gebundenes Buch
- Merkliste
- Auf die Merkliste
- Bewerten Bewerten
- Teilen
- Produkt teilen
- Produkterinnerung
- Produkterinnerung
Symposium M, 'Materials and Technology for Nonvolatile Memories', was held November 30-December 5 at the 2014 MRS Fall Meeting in Boston.
Andere Kunden interessierten sich auch für
- Jose van DijckMediated Memories in the Digital Age117,99 €
- Multifunctional Polymeric and Hybrid Materials116,99 €
- Advanced Structural Materials - 2014: Volume 1765119,99 €
- Advanced Materials for Biological and Biomedical Applications90,99 €
- Materials for Sustainable Development - Challenges and Opportunities: Volume 149270,99 €
- Tayyab I SuratwalaMaterials Science and Technology of Optical Fabrication168,99 €
- Cement: Materials Science and Technology155,99 €
-
-
-
Symposium M, 'Materials and Technology for Nonvolatile Memories', was held November 30-December 5 at the 2014 MRS Fall Meeting in Boston.
Hinweis: Dieser Artikel kann nur an eine deutsche Lieferadresse ausgeliefert werden.
Hinweis: Dieser Artikel kann nur an eine deutsche Lieferadresse ausgeliefert werden.
Produktdetails
- Produktdetails
- Verlag: Materials Research Society
- Seitenzahl: 152
- Erscheinungstermin: 9. September 2015
- Englisch
- Abmessung: 239mm x 154mm x 14mm
- Gewicht: 349g
- ISBN-13: 9781605117065
- ISBN-10: 1605117064
- Artikelnr.: 44267926
- Herstellerkennzeichnung
- Libri GmbH
- Europaallee 1
- 36244 Bad Hersfeld
- 06621 890
- Verlag: Materials Research Society
- Seitenzahl: 152
- Erscheinungstermin: 9. September 2015
- Englisch
- Abmessung: 239mm x 154mm x 14mm
- Gewicht: 349g
- ISBN-13: 9781605117065
- ISBN-10: 1605117064
- Artikelnr.: 44267926
- Herstellerkennzeichnung
- Libri GmbH
- Europaallee 1
- 36244 Bad Hersfeld
- 06621 890
Part I. Advanced Flash Memories: 1. Mixed-ionic-electronic-conduction
(MIEC)-based access devices for 3D multilayer crosspoint memory; 2. MANOS
erase performance dependence on nitrogen annealing conditions; Part II.
Resistive Switching Memories (ReRAM): 3. Unipolar resistive switching
behavior of high-k ternary rare-earth oxide LaHoO3 thin films for
non-volatile memory applications; 4. Influence of graphene interlayers on
electrode-electrolyte interfaces in resistive random accesses memory cells;
5. Nanosecond fast switching processes observed in gapless-type,
Ta2O5-based atomic switches; 6. XRD analysis of TRAM composed from
[Sb2Te3/GeTe] superlattice film and its switching characteristics; 7.
Effect of morphological change on unipolar and bipolar switching
characteristics in Pr0.7Ca0.3MnO3 based RRAM; 8. Experimental and
theoretical investigation of minimization of forming-induced variability in
resistive memory devices; 9. Material and device parameters influencing
multi-level resistive switching of room temperature grown titanium oxide
layers; 10. A comprehensive study of effect of composition on resistive
switching of HfxAl1-xOy based RRAM devices by combinatorial sputtering;
Part III. Magnetoresistive Random Access Memories (MRAM): 11. Perpendicular
magnetic anisotropy on W-based spin-orbit torque CoFeB MgO MRAM stacks;
12. Strain induced super-paramagnetism in Cr2O3 in the ultra thin film
limit; Part IV. Ferroelectric Random Access Memories (FeRAM): 13. Giant
self-polarization in FeRAM element based on sol-gel PZT films; 14. The
effect of H2 distribution in (Pb,La)(Zr,Ti)O3 capacitors with conductive
oxide electrodes on the degradation of ferroelectric properties; 15.
Chemical fluid deposition of Hf-Zr-O-based thin films using supercritical
carbon dioxide fluid; 16. Ferroelectricity in strategically synthesized
Pb-free LiNbO3-type ZnSnO3 nanostructure arrayed thick films; 17.
Measurements of polarization switching in LiNbO3-type ZnSnO3/ZnO
nanocomposite thin films; Part V. Polymer Memories and Emerging Materials:
18. Photo-controllable resistive memory based on polymer materials; 19.
Determining the efficiency of fast ultrahigh-density writing of
low-conductivity patterns on semiconducting polymers; 20. Photoelectron
spectroscopy characterization and computational modeling of gadolinium
nitride thin films synthesized by chemical vapor deposition; 21.
Chemo-ionic-conformational memory from reactive dense gels: a way to
explore new multivalent memories and brain memory.
(MIEC)-based access devices for 3D multilayer crosspoint memory; 2. MANOS
erase performance dependence on nitrogen annealing conditions; Part II.
Resistive Switching Memories (ReRAM): 3. Unipolar resistive switching
behavior of high-k ternary rare-earth oxide LaHoO3 thin films for
non-volatile memory applications; 4. Influence of graphene interlayers on
electrode-electrolyte interfaces in resistive random accesses memory cells;
5. Nanosecond fast switching processes observed in gapless-type,
Ta2O5-based atomic switches; 6. XRD analysis of TRAM composed from
[Sb2Te3/GeTe] superlattice film and its switching characteristics; 7.
Effect of morphological change on unipolar and bipolar switching
characteristics in Pr0.7Ca0.3MnO3 based RRAM; 8. Experimental and
theoretical investigation of minimization of forming-induced variability in
resistive memory devices; 9. Material and device parameters influencing
multi-level resistive switching of room temperature grown titanium oxide
layers; 10. A comprehensive study of effect of composition on resistive
switching of HfxAl1-xOy based RRAM devices by combinatorial sputtering;
Part III. Magnetoresistive Random Access Memories (MRAM): 11. Perpendicular
magnetic anisotropy on W-based spin-orbit torque CoFeB MgO MRAM stacks;
12. Strain induced super-paramagnetism in Cr2O3 in the ultra thin film
limit; Part IV. Ferroelectric Random Access Memories (FeRAM): 13. Giant
self-polarization in FeRAM element based on sol-gel PZT films; 14. The
effect of H2 distribution in (Pb,La)(Zr,Ti)O3 capacitors with conductive
oxide electrodes on the degradation of ferroelectric properties; 15.
Chemical fluid deposition of Hf-Zr-O-based thin films using supercritical
carbon dioxide fluid; 16. Ferroelectricity in strategically synthesized
Pb-free LiNbO3-type ZnSnO3 nanostructure arrayed thick films; 17.
Measurements of polarization switching in LiNbO3-type ZnSnO3/ZnO
nanocomposite thin films; Part V. Polymer Memories and Emerging Materials:
18. Photo-controllable resistive memory based on polymer materials; 19.
Determining the efficiency of fast ultrahigh-density writing of
low-conductivity patterns on semiconducting polymers; 20. Photoelectron
spectroscopy characterization and computational modeling of gadolinium
nitride thin films synthesized by chemical vapor deposition; 21.
Chemo-ionic-conformational memory from reactive dense gels: a way to
explore new multivalent memories and brain memory.
Part I. Advanced Flash Memories: 1. Mixed-ionic-electronic-conduction
(MIEC)-based access devices for 3D multilayer crosspoint memory; 2. MANOS
erase performance dependence on nitrogen annealing conditions; Part II.
Resistive Switching Memories (ReRAM): 3. Unipolar resistive switching
behavior of high-k ternary rare-earth oxide LaHoO3 thin films for
non-volatile memory applications; 4. Influence of graphene interlayers on
electrode-electrolyte interfaces in resistive random accesses memory cells;
5. Nanosecond fast switching processes observed in gapless-type,
Ta2O5-based atomic switches; 6. XRD analysis of TRAM composed from
[Sb2Te3/GeTe] superlattice film and its switching characteristics; 7.
Effect of morphological change on unipolar and bipolar switching
characteristics in Pr0.7Ca0.3MnO3 based RRAM; 8. Experimental and
theoretical investigation of minimization of forming-induced variability in
resistive memory devices; 9. Material and device parameters influencing
multi-level resistive switching of room temperature grown titanium oxide
layers; 10. A comprehensive study of effect of composition on resistive
switching of HfxAl1-xOy based RRAM devices by combinatorial sputtering;
Part III. Magnetoresistive Random Access Memories (MRAM): 11. Perpendicular
magnetic anisotropy on W-based spin-orbit torque CoFeB MgO MRAM stacks;
12. Strain induced super-paramagnetism in Cr2O3 in the ultra thin film
limit; Part IV. Ferroelectric Random Access Memories (FeRAM): 13. Giant
self-polarization in FeRAM element based on sol-gel PZT films; 14. The
effect of H2 distribution in (Pb,La)(Zr,Ti)O3 capacitors with conductive
oxide electrodes on the degradation of ferroelectric properties; 15.
Chemical fluid deposition of Hf-Zr-O-based thin films using supercritical
carbon dioxide fluid; 16. Ferroelectricity in strategically synthesized
Pb-free LiNbO3-type ZnSnO3 nanostructure arrayed thick films; 17.
Measurements of polarization switching in LiNbO3-type ZnSnO3/ZnO
nanocomposite thin films; Part V. Polymer Memories and Emerging Materials:
18. Photo-controllable resistive memory based on polymer materials; 19.
Determining the efficiency of fast ultrahigh-density writing of
low-conductivity patterns on semiconducting polymers; 20. Photoelectron
spectroscopy characterization and computational modeling of gadolinium
nitride thin films synthesized by chemical vapor deposition; 21.
Chemo-ionic-conformational memory from reactive dense gels: a way to
explore new multivalent memories and brain memory.
(MIEC)-based access devices for 3D multilayer crosspoint memory; 2. MANOS
erase performance dependence on nitrogen annealing conditions; Part II.
Resistive Switching Memories (ReRAM): 3. Unipolar resistive switching
behavior of high-k ternary rare-earth oxide LaHoO3 thin films for
non-volatile memory applications; 4. Influence of graphene interlayers on
electrode-electrolyte interfaces in resistive random accesses memory cells;
5. Nanosecond fast switching processes observed in gapless-type,
Ta2O5-based atomic switches; 6. XRD analysis of TRAM composed from
[Sb2Te3/GeTe] superlattice film and its switching characteristics; 7.
Effect of morphological change on unipolar and bipolar switching
characteristics in Pr0.7Ca0.3MnO3 based RRAM; 8. Experimental and
theoretical investigation of minimization of forming-induced variability in
resistive memory devices; 9. Material and device parameters influencing
multi-level resistive switching of room temperature grown titanium oxide
layers; 10. A comprehensive study of effect of composition on resistive
switching of HfxAl1-xOy based RRAM devices by combinatorial sputtering;
Part III. Magnetoresistive Random Access Memories (MRAM): 11. Perpendicular
magnetic anisotropy on W-based spin-orbit torque CoFeB MgO MRAM stacks;
12. Strain induced super-paramagnetism in Cr2O3 in the ultra thin film
limit; Part IV. Ferroelectric Random Access Memories (FeRAM): 13. Giant
self-polarization in FeRAM element based on sol-gel PZT films; 14. The
effect of H2 distribution in (Pb,La)(Zr,Ti)O3 capacitors with conductive
oxide electrodes on the degradation of ferroelectric properties; 15.
Chemical fluid deposition of Hf-Zr-O-based thin films using supercritical
carbon dioxide fluid; 16. Ferroelectricity in strategically synthesized
Pb-free LiNbO3-type ZnSnO3 nanostructure arrayed thick films; 17.
Measurements of polarization switching in LiNbO3-type ZnSnO3/ZnO
nanocomposite thin films; Part V. Polymer Memories and Emerging Materials:
18. Photo-controllable resistive memory based on polymer materials; 19.
Determining the efficiency of fast ultrahigh-density writing of
low-conductivity patterns on semiconducting polymers; 20. Photoelectron
spectroscopy characterization and computational modeling of gadolinium
nitride thin films synthesized by chemical vapor deposition; 21.
Chemo-ionic-conformational memory from reactive dense gels: a way to
explore new multivalent memories and brain memory.