Andere Kunden interessierten sich auch für
![DEVELOPMENT OF PROCESS CONTROL FOR THIN FILM POLY-SILICON CVD REACTOR]( "DEVELOPMENT OF PROCESS CONTROL FOR THIN FILM POLY-SILICON CVD REACTOR")
DEVELOPMENT OF PROCESS CONTROL FOR THIN FILM POLY-SILICON CVD REACTOR39,99 €![FABRICATING SILICON THIN-FILM TRANSISTORS ON PLASTIC AT 300C]( "FABRICATING SILICON THIN-FILM TRANSISTORS ON PLASTIC AT 300C")
FABRICATING SILICON THIN-FILM TRANSISTORS ON PLASTIC AT 300C51,99 €![ZnO Thin-Film Transistors for Cost-Efficient Flexible Electronics]( "ZnO Thin-Film Transistors for Cost-Efficient Flexible Electronics")
ZnO Thin-Film Transistors for Cost-Efficient Flexible Electronics74,99 €![Semiconducting Metal Oxide Thin-Film Transistors]( "Semiconducting Metal Oxide Thin-Film Transistors")
Semiconducting Metal Oxide Thin-Film Transistors206,99 €![Amorphous Silicon Thin-Film Transistors]( "Amorphous Silicon Thin-Film Transistors")
Amorphous Silicon Thin-Film Transistors44,99 €![Zinc Oxide Thin-Film Transistors]( "Zinc Oxide Thin-Film Transistors")
Zinc Oxide Thin-Film Transistors38,99 €![ZnO Thin-Film Transistors for Cost-Efficient Flexible Electronics]( "ZnO Thin-Film Transistors for Cost-Efficient Flexible Electronics")
ZnO Thin-Film Transistors for Cost-Efficient Flexible Electronics74,99 €
Nowadays,active-matrix addressing using a-Si TFTs is
dominating in the flat panel display markets.
However, low temperature polysilicon has been
proposed and considered to be a promising alternative
technology. Metal induced crystallization (MIC) is
one of the methods to obtain high quality polysilicon
films at low temperatures.
A few technologies are presented in this monograph,
which improve the quality of MIC polysilicon film and
hence the performance of TFTs built on.
Amelioration of MIC processes has been made to
produce high performance polysilicon TFTs using
solution based MIC (SMIC) and defined-grain MIC
(DG-MIC) methods.
Novel post-annealing technologies are also introduced
to reduce the micro-defects in MIC polysilicon film
and hence to achieve better performance. These
technologies include YAG laser post-annealing and
flash lamp post-annealing. Particularly, it is the
first time to report the application of flash lamp
annealing technology in the fabrication of low
temperature polysilicon and TFTs.
dominating in the flat panel display markets.
However, low temperature polysilicon has been
proposed and considered to be a promising alternative
technology. Metal induced crystallization (MIC) is
one of the methods to obtain high quality polysilicon
films at low temperatures.
A few technologies are presented in this monograph,
which improve the quality of MIC polysilicon film and
hence the performance of TFTs built on.
Amelioration of MIC processes has been made to
produce high performance polysilicon TFTs using
solution based MIC (SMIC) and defined-grain MIC
(DG-MIC) methods.
Novel post-annealing technologies are also introduced
to reduce the micro-defects in MIC polysilicon film
and hence to achieve better performance. These
technologies include YAG laser post-annealing and
flash lamp post-annealing. Particularly, it is the
first time to report the application of flash lamp
annealing technology in the fabrication of low
temperature polysilicon and TFTs.