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"Micro-electronic Processes for VLSI Fabrication" is a comprehensive and authoritative guide that delves into the fundamental principles and advanced techniques used in the fabrication of Very Large Scale Integrated (VLSI) circuits. Covering a wide array of topics, the book begins with an in-depth introduction to Silicon Semiconductor Technology, including an overview of semiconductor materials, the crystal structure of silicon, intrinsic and extrinsic semiconductors, and the intricacies of doping and carrier concentration. Subsequent chapters delve into crucial aspects of VLSI fabrication, exploring wafer processing techniques, such as growth, preparation, defect inspection, and various wafer cleaning methods. The critical process of oxidation is covered in detail, explaining thermal, dry, and wet oxidation techniques along with oxide growth models.The book extensively examines epitaxial deposition methods, including Chemical Vapor Deposition (CVD), Molecular Beam Epitaxy (MBE), and selective epitaxy. Ion implantation and diffusion, pivotal processes for semiconductor device fabrication, are also meticulously discussed, with insights into ion implantation processes.