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This book describe how nanoscale resist patterns technology were machined or fabricated on a silicon substrate using a scanning probe microscope (SPM) based on nanolithography (SPNL). The advantage by using this technology is the low cost of nanopatterning device technology can be created, where an atomic force microscope (AFM) is used. Conventional SPNL directly writes nanopatterns using a single probe cantilever.

Produktbeschreibung
This book describe how nanoscale resist patterns technology were machined or fabricated on a silicon substrate using a scanning probe microscope (SPM) based on nanolithography (SPNL). The advantage by using this technology is the low cost of nanopatterning device technology can be created, where an atomic force microscope (AFM) is used. Conventional SPNL directly writes nanopatterns using a single probe cantilever.
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