Cullis

Microscopy of Semiconducting Materials 1987, Proceedings of the Institute of Physics Conference, Oxford University, April 1987

• Gebundenes Buch

Produktbeschreibung

Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques.

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Produktdetails

• Verlag: Taylor & Francis Ltd (Sales)
• Seitenzahl: 820
• Erscheinungstermin: 1. Oktober 1987
• Englisch
• Abmessung: 234mm x 156mm x 43mm
• Gewicht: 1311g
• ISBN-13: 9780854981786
• ISBN-10: 0854981780
• Artikelnr.: 21429308

Autorenporträt

A. G. Cullis (Author) , P. D. Augustus (Volume editor)

Inhaltsangabe

High resolution microscopy (9 papers). Epitaxial layers (21 papers).
Quantum wells and superlattices (11 papers). Properties of dislocations (5
papers). Device silicon and dielectric structures (24 papers). Silicides
and contacts (5 papers). Device testing (6 papers). X-ray techniques (5
papers). Microanalysis (6 papers). Advanced scanning microscopy techniques
(17 papers). Bulk gallium arsenide and other compounds (15 papers). Author
index. Subject index.