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Please note that the content of this book primarily consists of articles available from Wikipedia or other free sources online. Nitrogen trifluoride is the inorganic compound with the formula NF3. This nitrogen-fluorine compound is a colorless, toxic, odourless, nonflammable gas. It finds increasing use as an etchant in microelectronics. Nitrogen trifluoride is used in the plasma etching of silicon wafers. Today nitrogen trifluoride is predominantly employed in the cleaning of the PECVD chambers in the high volume production of liquid crystal displays and silicon-based thin film solar cells. In these applications NF3 is initially broken down in situ, by a plasma. The resulting fluorine atoms are the active cleaning agents that attack the polysilicon,silicon nitride and silicon oxide. Nitrogen trifluoride can be used as well with tungsten silicide, and tungsten produced by CVD. NF3 has been considered as an environmentally preferable substitute for perfluorocarbons such as hexafluoroethane,sulfur hexafluoride etc... The process utilization of the chemicals applied in plasma processes is typically below 20 %. Therefore some of the PFCs and also of the NF3 always escape into the atmosphere. Modern gas abatement systems can decrease such emissions.