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1. Introduction.- 2. Methods of Preparation of Thin Films.- 2.1 Chemical and Electrochemical Methods.- 2.2 Cathode Sputtering.- 2.3 Vacuum Evaporation.- 3. Thin Film Thickness and Deposition Rate Measurement Methods.- 3.1 Balance Methods.- 3.2 Electrical Methods.- 3.3 Optical Methods.- 3.4 Deposition Rate Monitoring Using Transfer of Momentum.- 3.5 Special Thickness Monitoring Methods.- 4. Mechanism of Film Formation.- 4.1 Formation Stages of Thin Films.- 4.2 Nucleation.- 4.3 Growth and Coalescence of Islands.- 4.4 Influence of Various Factors on Final Structure of Film.- 4.5 Crystallographic Structure of Thin Films.- 4.6 Epitaxial Films.- 5. Composition, Morphology and Structure of Thin Films.- 5.1 Methods for Determination of Chemical Composition of Films.- 5.2 Electron Microscopy of Thin Films.- 5.3 Diffraction of Electrons.- 5.4 X-ray Methods.- 5.5 Auger Spectroscopy.- 6. Properties of Thin Films.- 6.1 Mechanical Properties.- 6.2 Electrical and Magnetic Properties of Thin Films.- 6.3 Optical Properties of Thin Films.- 7. Application of This Films.- 7.1 Optical Applications.- 7.2 Applications in Electronics.- References.