Plasma-Assisted Atomic Layer Deposition of III-Nitride Thin Films - Özgit-Akgün, Ça la
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III-nitride compound semiconductors (AlN, GaN, InN) and their alloys have emerged as versatile and high-performance materials for a wide range of electronic and optoelectronic device applications. Although high quality III-nitride thin films can be grown at high temperatures (1000 °C) with significant rates, deposition of these films on temperature-sensitive device layers and substrates necessitates the adaptation of low-temperature methods such as atomic layer deposition (ALD). When compared to other low-temperature thin film deposition techniques, ALD stands out with its self-limiting growth…mehr

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Produktbeschreibung
III-nitride compound semiconductors (AlN, GaN, InN) and their alloys have emerged as versatile and high-performance materials for a wide range of electronic and optoelectronic device applications. Although high quality III-nitride thin films can be grown at high temperatures (1000 °C) with significant rates, deposition of these films on temperature-sensitive device layers and substrates necessitates the adaptation of low-temperature methods such as atomic layer deposition (ALD). When compared to other low-temperature thin film deposition techniques, ALD stands out with its self-limiting growth mechanism, which enables the deposition of highly uniform and conformal thin films with sub-angstrom thickness control. These unique characteristics make ALD a powerful method especially for depositing films on nanostructured templates, as well as preparing alloy thin films with well-defined compositions. This monograph reports on the development of low-temperature ( 200 °C) plasma-assistedALD processes for III-nitrides, and presents detailed characterization results for the deposited thin films and fabricated nanostructures.
Autorenporträt
Dr. Çäla Özgit-Akgün received her B.Sc. and M.Sc. degrees in Metallurgical and Materials Engineering from Middle East Technical University, in 2006 and 2009, respectively, and her Ph.D. degree in Materials Science and Nanotechnology from Bilkent University, in 2014. Currently, she is a postdoctoral research associate at Bilkent University - UNAM.