Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory.
Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences.
A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency.
The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor.
Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences.
A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency.
The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor.
Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
"This text serves both the expert and the newcomer with background and state-of-the-art knowledge of plasma electronics. It should be on the bookshelf of anyone exploiting plasma technology for device fabrication. Clearly written and well illustrated, it is also suitable as a postgraduate teaching text and, having been updated, may be a standard reference for the next decade."
-Nigel J. Mason, Professor, Department of Physical Sciences, The Open University
"This book is a unique and invaluable source of insight and clarity with special strengths in treating charged particle-neutral collisions, rigorously generalized with proper kinetic theory. This rigor in analyzing discharge physics fundamentals makes the subsequent treatment of plasma modeling and surface modification applications in microelectronics even more valuable. It will no doubt become a standard reference for all scientists and engineers interested in weakly ionized, non-equilibrium plasmas."
-David B. Graves, Professor and Lam Research Distinguished Chair, Department of Chemical and Biomolecular Engineering, University of California, Berkeley
"... unique in the low-temperature plasma literature for the breadth of its aims and wide-ranging scope, and I would strongly recommend as a reference for postgraduate students in the field."
-Robert E. Robson, Professor, James Cook University
"This book discusses the fundamental principles of partially ionized, chemically reactive plasma discharges and their use in thin film processing ... a well-written book for plasma engineers and scientists. ... [they] will benefit a lot from this book ..."
-Hong-Young Chang, Professor, Korean Advanced Institute of Science and Technology (KAIST)
"A unique textbook written by two of the most outstanding scientists in the field ... A very valuable part of the book is devoted to modeling and numerical simulation ... an indispensable source of knowledge and an excellent reference for all kinds of basic phenomena."
-Uwe Czarnetzki, Professor and Chair, Faculty of Physics and Astronomy, Ruhr-Universität Bochum
"The book offers a truly excellent account on the fundamental physics of low-temperature plasmas and applications of low-temperature plasmas to other scientific disciplines and technologies. I strongly recommend this book to both newcomers as a high-standard introductory textbook and experts as a comprehensive reference."
-Satoshi Hamaguchi, Professor, Center for Atomic and Molecular Technologies, Osaka University
-Nigel J. Mason, Professor, Department of Physical Sciences, The Open University
"This book is a unique and invaluable source of insight and clarity with special strengths in treating charged particle-neutral collisions, rigorously generalized with proper kinetic theory. This rigor in analyzing discharge physics fundamentals makes the subsequent treatment of plasma modeling and surface modification applications in microelectronics even more valuable. It will no doubt become a standard reference for all scientists and engineers interested in weakly ionized, non-equilibrium plasmas."
-David B. Graves, Professor and Lam Research Distinguished Chair, Department of Chemical and Biomolecular Engineering, University of California, Berkeley
"... unique in the low-temperature plasma literature for the breadth of its aims and wide-ranging scope, and I would strongly recommend as a reference for postgraduate students in the field."
-Robert E. Robson, Professor, James Cook University
"This book discusses the fundamental principles of partially ionized, chemically reactive plasma discharges and their use in thin film processing ... a well-written book for plasma engineers and scientists. ... [they] will benefit a lot from this book ..."
-Hong-Young Chang, Professor, Korean Advanced Institute of Science and Technology (KAIST)
"A unique textbook written by two of the most outstanding scientists in the field ... A very valuable part of the book is devoted to modeling and numerical simulation ... an indispensable source of knowledge and an excellent reference for all kinds of basic phenomena."
-Uwe Czarnetzki, Professor and Chair, Faculty of Physics and Astronomy, Ruhr-Universität Bochum
"The book offers a truly excellent account on the fundamental physics of low-temperature plasmas and applications of low-temperature plasmas to other scientific disciplines and technologies. I strongly recommend this book to both newcomers as a high-standard introductory textbook and experts as a comprehensive reference."
-Satoshi Hamaguchi, Professor, Center for Atomic and Molecular Technologies, Osaka University