W. N. G. Hitchon

Plasma Processes for Semiconductor Fabrication

Herausgeber: Ahmad, Haroon; Pepper, Michael

• Broschiertes Buch

Produktbeschreibung

An up-to-date description of plasma etching and deposition in semiconductor fabrication.

Produktdetails

• Verlag: Cambridge University Press
• Seitenzahl: 232
• Erscheinungstermin: 31. Mai 2005
• Englisch
• Abmessung: 254mm x 178mm x 13mm
• Gewicht: 445g
• ISBN-13: 9780521018005
• ISBN-10: 0521018005
• Artikelnr.: 20974609

Inhaltsangabe

1. Introduction
2. Plasma processes and semiconductors
3. Plasma electromagnetics and circuit models
4. Plasma models
5. Plasma chemistry
6. Transport at long mean free path
7. Evolution of the trench
8. Physical description of the plasma
9. Going further
10. Glossary.

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1. Introduction; 2. Plasma processes and semiconductors; 3. Plasma electromagnetics and circuit models; 4. Plasma models; 5. Plasma chemistry; 6. Transport at long mean free path; 7. Evolution of the trench; 8. Physical description of the plasma; 9. Going further; 10. Glossary.