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New challenges are emerging for plasma-based processes as we shift from thin film technology to nanotechnology. Offering numerous examples of plasma processing of nanomaterials, this book provides an in-depth overview of recent advances in this crucial area, as well as threats to its development. Addressing both experimental and theoretical aspects of plasma processing technology, the author illustrates examples of its successful application in nanoelectronics, catalysis, energy sensors, nanomedicine, and several other fields.

Produktbeschreibung
New challenges are emerging for plasma-based processes as we shift from thin film technology to nanotechnology. Offering numerous examples of plasma processing of nanomaterials, this book provides an in-depth overview of recent advances in this crucial area, as well as threats to its development. Addressing both experimental and theoretical aspects of plasma processing technology, the author illustrates examples of its successful application in nanoelectronics, catalysis, energy sensors, nanomedicine, and several other fields.
Autorenporträt
R. Mohan Sankaran is an Associate Professor of Chemical Engineering at Case Western Reserve University (CWRU) in Cleveland, Ohio. He received his Bachelor's degree in Chemical Engineering from the University of California at Los Angeles in 1998 and his Ph.D. in Chemical Engineering from the California Institute of Technology in 2004. He joined the Department of Chemical Engineering at CWRU in 2005 as the John C. Angus Legacy Assistant Professor. As a faculty member, he has received several awards, including the CAREER Award from the National Science Foundation, the Young Investigator Program Award from the Air Force Office of Scientific Research, the Camille Dreyfus Teacher-Scholar Award, the Case School of Engineering Research Award, and the Peter Mark Memorial Award from the American Vacuum Society. He is recognized worldwide for his work on atmospheric-pressure microplasmas and their application in nanomaterials synthesis. Dr. Sankaran received the American Vacuum Society's 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.