RF- Sputtered Cadmium Oxide thin films for gas sensing application - Gadipelly, Anil Kumar;Reddy, M.V.Ramana
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In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.

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Produktbeschreibung
In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.
Autorenporträt
Dr.Anil Kumar Gadipelly completed his Ph.D in Physics from Department of Physics,Osmania University,Hyderabad.His area of research includes thin films and nanostructured materials for various photonic applications. Prof.M.V.Ramana Reddy is currently working in Osmania University.