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Megasonic cleaning is routinely used in the
semiconductor industry to remove particle
contaminants from wafer and mask surfaces. Cleaning
is achieved through proper choice of chemical
solutions, power density & frequency of acoustic
field. Considerable work has been done to increase
the understanding of particle removal mechanisms in
megasonic cleaning using different solution
chemistries with varying ionic strengths. However,
to date, the focus of all these studies of particle
removal has been either cavitation or acoustic
streaming. It is well known that the propagation of
sound through a colloidal dispersion containing ions
results in the generation of two types of
oscillating electric potentials, namely, Ionic
Vibration Potential & Colloid Vibration Potential.
This book reviews some of the current work that
shows that these potentials and their associated
electric fields can exert significant forces on
charged particles adhered to a surface, resulting in
their removal.
semiconductor industry to remove particle
contaminants from wafer and mask surfaces. Cleaning
is achieved through proper choice of chemical
solutions, power density & frequency of acoustic
field. Considerable work has been done to increase
the understanding of particle removal mechanisms in
megasonic cleaning using different solution
chemistries with varying ionic strengths. However,
to date, the focus of all these studies of particle
removal has been either cavitation or acoustic
streaming. It is well known that the propagation of
sound through a colloidal dispersion containing ions
results in the generation of two types of
oscillating electric potentials, namely, Ionic
Vibration Potential & Colloid Vibration Potential.
This book reviews some of the current work that
shows that these potentials and their associated
electric fields can exert significant forces on
charged particles adhered to a surface, resulting in
their removal.