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This book gives an idea of modifications in fabrication steps of 22nm MOS transistor. A 22nm MOS transistor results are compared with a new modification process of stress.Their are two types of stress uniaxial and biaxial stress. Key Features: 1. Concept of Scaling. 2. Basic concept of MOS transistor. 3. Fabication process of 180nm MOS transistor. 4. Modified processes used in fabrication of 22nm MOS transistor.

Produktbeschreibung
This book gives an idea of modifications in fabrication steps of 22nm MOS transistor. A 22nm MOS transistor results are compared with a new modification process of stress.Their are two types of stress uniaxial and biaxial stress. Key Features: 1. Concept of Scaling. 2. Basic concept of MOS transistor. 3. Fabication process of 180nm MOS transistor. 4. Modified processes used in fabrication of 22nm MOS transistor.
Autorenporträt
Madhuri Borkar is currently searching a job in research field of nano-technology.Miss Madhuri Borkar holds degree a Bachelor of Engineering in Electronics and Communication from UIT-R.G.P.V. Bhopal, a Masters degree in VLSI design from VNIT Nagpur.