Fourth volume of a 40volume series on nano science and nanotechnology, edited by the renowned scientist Challa S.S.R. Kumar. This handbook gives a comprehensive overview about Surface Science Tools for Nanomaterials Characterization. Modern applications and state-of-the-art techniques are covered and make this volume an essential reading for research scientists in academia and industry.
Fourth volume of a 40volume series on nano science and nanotechnology, edited by the renowned scientist Challa S.S.R. Kumar. This handbook gives a comprehensive overview about Surface Science Tools for Nanomaterials Characterization. Modern applications and state-of-the-art techniques are covered and make this volume an essential reading for research scientists in academia and industry.
Artikelnr. des Verlages: 86370071, 978-3-662-44550-1
2015
Seitenzahl: 664
Erscheinungstermin: 27. März 2015
Englisch
Abmessung: 241mm x 160mm x 41mm
Gewicht: 1094g
ISBN-13: 9783662445501
ISBN-10: 3662445506
Artikelnr.: 41175317
Herstellerkennzeichnung
Books on Demand GmbH
In de Tarpen 42
22848 Norderstedt
info@bod.de
040 53433511
Autorenporträt
Dr. Challa S. S. R. Kumar is Director of Nanofabrication and Nanomaterials at the Center for Advanced Microstructures and Devices at Louisiana State University in Baton Rouge, USA. He is also President and CEO of Magnano Technologies and has some years of industrial R&D experience working for Imperial Chemical Industries and United Breweries. His main research interests are the development of novel synthetic methods, including those based on microfluidic reactors, for the synthesis of multifunctional nanomaterials. Dr. Kumar is the winner of the 2006 Nano 50 Technology Award for his work in magnetic-based nanoparticles for cancer imaging and treatment. He is the editor and author of several books and journal articles and a former editor of the Journal of Biomedical Nanotechnology.
Inhaltsangabe
Higher Resolution Scanning Probe Methods for Magnetic Imaging.- The Synchrotron Based VUV Resonant Photoemission for Characterisation of Nanomaterials.- SPM for Characterization of PbSe Nanocrystals.-Scanning Probe Microscopy for Nanolithography.- Kelvin Probe Force Microscopy.-Synchrotron Radiation X-ray Photoelectron Spectroscopy.- Scanning Electrochemical Potential Microscopy (SECPM) and Electrochemical STM (EC-STM).- Band Bending at Metal-Semiconductor and Metal-Ferroelectric Interfaces Investigated by Photoelectron Spectroscopy.- Magnetic Force Microscopy.- High Resolution STM Imaging.-Numerical Simulations on Nanotips for FIM and FEM .-ARPES on Organic Semiconductor Single Crystals Crystalline Films.- FIM-Characterized Tips for SPM.- Scanning Conductive Torsion Mode Microscopy.- Scanning Probe Acceleration Microscopy (SPAM).- Combining Micromanipulation, Kerr Magnetometry and Magnetic Force Microscopy for Characterization of Magnetic Nanostructures.- Field Ion Microscopy (FIM).- Non-Contact Atomic Force Microscopy for Characterization of Nanostructures and Beyond.
Higher Resolution Scanning Probe Methods for Magnetic Imaging.- The Synchrotron Based VUV Resonant Photoemission for Characterisation of Nanomaterials.- SPM for Characterization of PbSe Nanocrystals.-Scanning Probe Microscopy for Nanolithography.- Kelvin Probe Force Microscopy.-Synchrotron Radiation X-ray Photoelectron Spectroscopy.- Scanning Electrochemical Potential Microscopy (SECPM) and Electrochemical STM (EC-STM).- Band Bending at Metal-Semiconductor and Metal-Ferroelectric Interfaces Investigated by Photoelectron Spectroscopy.- Magnetic Force Microscopy.- High Resolution STM Imaging.-Numerical Simulations on Nanotips for FIM and FEM .-ARPES on Organic Semiconductor Single Crystals Crystalline Films.- FIM-Characterized Tips for SPM.- Scanning Conductive Torsion Mode Microscopy.- Scanning Probe Acceleration Microscopy (SPAM).- Combining Micromanipulation, Kerr Magnetometry and Magnetic Force Microscopy for Characterization of Magnetic Nanostructures.- Field Ion Microscopy (FIM).- Non-Contact Atomic Force Microscopy for Characterization of Nanostructures and Beyond.
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