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Porous silicon has been used in many applications such as light-emitting materials in optoelectronics, bone growth media, gas and humidity sensors, sacrificial layers in micromachining, surface texturization in photovoltaics or substrate material in mass spectrometry. Also it is important in the industries of solar cells and diffusion membrane. Formation of porous silicon can be carried out by chemical etching, photo-etching, stain etching in presence of oxidizing agent, metal-assisted etching and anodic etching.

Produktbeschreibung
Porous silicon has been used in many applications such as light-emitting materials in optoelectronics, bone growth media, gas and humidity sensors, sacrificial layers in micromachining, surface texturization in photovoltaics or substrate material in mass spectrometry. Also it is important in the industries of solar cells and diffusion membrane. Formation of porous silicon can be carried out by chemical etching, photo-etching, stain etching in presence of oxidizing agent, metal-assisted etching and anodic etching.
Autorenporträt
Awad Mogoda, PhD of physical chemistry from Cairo University in 1986. Prof. of physical chemistry at Cairo University. He interested in the studies of corrosion of metals and alloys, preparation of thin anodic oxide films, superconductors and porous silicon.