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This work covers two goals: 1-The first goal is to design and construct a simple broad beam ion source with its utilization in different applications. The beam characteristics are investigated by measuring the extracted ion current under different experimental conditions. Magnetic field, gas pressure, discharge voltage and extraction potential are variable parameters. Optimization of the ion source parameters is followed for associated studies. 2-The second goal is to achieve certain applications using the beams extracted from our developed broad beam ion source. Therefore, it considers the interaction processes of the beams with the nominated targets. Hence, it includes; ¿ Adhesion improvement of PTFE by low energy ion beam irradiation. ¿ Metalization of PTFE by ion beam sputtering process. ¿ Surface modification of PET by low energy ion beam irradiation.