ZnO Films Fabricated by AP-MOCVD - Huang, Yen Chin;Yih Uen, Wu;Ming Lan, Shan
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This book focuses on the characteristics of ZnO films fabricated by AP-MOCVD. ZnO shows high optical transmittance (greater than 85%) and electrical conductivity (resistivity about 10-4 -cm) for the transparent electrode. Particularly, compared to ITO, the material resource of ZnO is ample and no after-use worry concerned with the environmental protection is required. So this thesis has completed that the characterizations of undoped, n- and p-type ZnO semiconductors fabricated by AP-MOCVD.

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Produktbeschreibung
This book focuses on the characteristics of ZnO films fabricated by AP-MOCVD. ZnO shows high optical transmittance (greater than 85%) and electrical conductivity (resistivity about 10-4 -cm) for the transparent electrode. Particularly, compared to ITO, the material resource of ZnO is ample and no after-use worry concerned with the environmental protection is required. So this thesis has completed that the characterizations of undoped, n- and p-type ZnO semiconductors fabricated by AP-MOCVD.
Autorenporträt
Yen Chin Huang is a member of the Arima Photovoltaic & Optical Corporation. He earned his Ph.D. in Department of Electronic Engineering, College of Electrical Engineering and Computer Science, Chung Yuan Christian University. Dr. Huang has wide experience in semiconductor materials and optoelectronic devices.