In addition to the discussion of fundamental physical and technical aspects of IPE spectroscopic applications, several "hot¿ topics are addressed. These include development of new insulating materials for advances Si MOS technology (both high-k gate insulators and low-k dielectrics for interconnect insulation), metal gate materials, development of heterostructures based on high-mobility semiconductors, etc. Thanks to a considerable activity in this field over the last few years, the recent results concerning band structure of most important interfaces involving novel materials can now be documented.
- First complete description of the internal photoemission phenomena
- A practical guide to internal photoemission measurements
- Describes reliable energy barrier determination procedures
- Surveys trap spectroscopy methods applicable to thin insulating layers
- Provides an overview of the most recent results on band structure of high-permittivity insulating materials and their interfaces
- Contains a complete collection of reference data on interface band alignment for wide-bandgap insulating materials in contact with metals and semiconductors
Dieser Download kann aus rechtlichen Gründen nur mit Rechnungsadresse in A, B, BG, CY, CZ, D, DK, EW, E, FIN, F, GR, HR, H, IRL, I, LT, L, LR, M, NL, PL, P, R, S, SLO, SK ausgeliefert werden.