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This reference provides in-depth coverage of the technologies and various approaches in luminous chemical vapor deposition (LCVD) and showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative science. Timely and up-to-date, this book provides broad coverage of the complex relationships involved in the interface between gas/solid, liquid/solid, and solid/solid. The authors present a new perspective on low-pressure plasma and describe key aspects…mehr

Produktbeschreibung
This reference provides in-depth coverage of the technologies and various approaches in luminous chemical vapor deposition (LCVD) and showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative science. Timely and up-to-date, this book provides broad coverage of the complex relationships involved in the interface between gas/solid, liquid/solid, and solid/solid. The authors present a new perspective on low-pressure plasma and describe key aspects of the surface and interface that could not be shown without the results obtained by LCVD technologies.

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