Shengkai Wang, Xiaolei Wang

MOS Interface Physics, Process and Characterization (eBook, ePUB)

• Format: ePub

Produktbeschreibung

The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental examples focusing on MOS and will be a reference for academics and postgraduates in the field of microelectronics.

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Produktdetails

• Verlag: Taylor & Francis
• Seitenzahl: 174
• Erscheinungstermin: 4. Oktober 2021
• Englisch
• ISBN-13: 9781000455762
• Artikelnr.: 62441229

Autorenporträt

Shengkai Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the University of Tokyo in 2011 and has been engaged in Ge, III-V, SiC in MOS technology. He has published more than 100 papers and authorized 40+ patents.

Xiaolei Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the Institute of Microelectronics, Chinese Academy of Sciences in 2013 and has been engaged in Si/Ge based MOS technology. He has published more than 100 papers.

Inhaltsangabe

Introduction of MOSFET
1. Physics of interface
2. MOS processes
3. MOS characterizations