Principles of each technology are introduced and illustrated with minimum mathematics involved. The capabilities of each technology in making sub-100nm structures are described. The limits of preventing a technology from further going down the dimensional scale are analyzed.
Drawing upon years of practical experience and using numerous examples, Zheng Cui covers state-of-the art technologies in nanofabrication including:
- Photon-based lithography
- Charged particle beams lithography
- Nanofabrication using scanning probes
- Nanoscale replication
- Nanoscale pattern transfer
- Indirect nanofabrication
- Nanofabrication by self-assembly
Nanofabrication: Principles, Capabilities and Limits will serve as a practical guide and first-hand reference for researchers and practitioners working in nanostructure fabrication and also provides a "tool box" of various techniques that can be easily adapted in different fields of applications.
Written for: Nanoscience and nanotechnology researchers and engineers, technical professionals and academic researchers in the fields of electrtonics, mechanical engineering, and chemical engineering.
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