Novel Nanocomposite Coatings (eBook, PDF)
Advances and Industrial Applications
Redaktion: Daniel, Rostislav; Musil, Jindrich
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Novel Nanocomposite Coatings (eBook, PDF)
Advances and Industrial Applications
Redaktion: Daniel, Rostislav; Musil, Jindrich
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Nanocomposite materials as a special class of nanostructured materials have recently attracted great interest due to their extraordinary mechanical properties as well as thermal stability and oxidation resistance. The unique structure and exceptional properties make nanocomposite materials a possible alternative to traditional polycrystalline mater
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Nanocomposite materials as a special class of nanostructured materials have recently attracted great interest due to their extraordinary mechanical properties as well as thermal stability and oxidation resistance. The unique structure and exceptional properties make nanocomposite materials a possible alternative to traditional polycrystalline mater
Dieser Download kann aus rechtlichen Gründen nur mit Rechnungsadresse in A, B, BG, CY, CZ, D, DK, EW, E, FIN, F, GR, HR, H, IRL, I, LT, L, LR, M, NL, PL, P, R, S, SLO, SK ausgeliefert werden.
Produktdetails
- Produktdetails
- Verlag: Taylor & Francis
- Seitenzahl: 344
- Erscheinungstermin: 16. Dezember 2014
- Englisch
- ISBN-13: 9789814411189
- Artikelnr.: 42367503
- Verlag: Taylor & Francis
- Seitenzahl: 344
- Erscheinungstermin: 16. Dezember 2014
- Englisch
- ISBN-13: 9789814411189
- Artikelnr.: 42367503
- Herstellerkennzeichnung Die Herstellerinformationen sind derzeit nicht verfügbar.
Rostislav Daniel is associate professor at the Department of Physical Metallurgy and Materials Testing, University of Leoben, Austria. He received his MSc in applied sciences and computer engineering, applied physics and physical engineering and PhD in applied sciences and computer engineering, plasma physics and physics of thin films at the University of West Bohemia. His main research areas are plasma physics and physics of thin films, synthesis of advanced hard nanocrystalline and nanocomposite thin films of optimized structures and physical properties, advanced structural characterization of solids, characterization of mechanical properties of thin films and bulk solids, measurements of residual stresses in thin films by optical and x-ray diffraction techniques, investigations of thermo-mechanical properties of thin films and bulk solids, study of thermal stability and oxidation resistance of thin films and bulk solids, and coating design and architecture. Jind¿ich Musil is professor of applied physics at the University of West Bohemia, Plze¿, Czech Republic. He received his MSc in electrical engineering at the Military Technical University, Brno, Czech Republic; PhD in physics and mathematics at Czechoslovak Academy of Sciences, Prague, Czech Republic; and DSc in physics and mathematics at Czechoslovak Academy of Sciences, Prague, Czech Republic. His main research areas are electromagnetic field, propagation of electromagnetic waves, microwave plasma discharges, plasma physics, thermonuclear fusion, lasers, plasma chemistry and physics of thin films, PVD and PACVD of thin films, high-rate pulsed reactive magnetron sputtering, and development of new technological processes and advanced systems for synthesis of novel hard and functional nanocomposite coatings.
Synthesis of New Nanostructured Materials. Nanocrystalline Materials.
Multilayers and Superlattices. Nanocomposite Films. Thin Film Processing.
Principles of Plasma Discharges. Physical Sputtering and Transport of
Sputtered Material. Sputter Deposition Techniques. Reactive Sputter
Deposition. Film Formation and Structure. Condensation of Sputtered
Material. Interface Formation. Nucleation and Growth. Microstructure of
Thin Films, Structure Zone Models, Advantages and Limitations of Sputter
Deposition Processes. Structure-Property Relation in Hard Films. Me-Si-N
Films With a Low and Intermediate Si Content. Structure, Morphology and
Phase Composition Hardness and Macrostress Oxidation Resistance Problems
with Reproducibility. Novel nanocomposite films - Zr-Si-N Films with a High
Si Content. Deposition Rate. Elemental Composition. Chemical Bonding and
Phase Composition. Electrical and Optical Properties. Structure.
Morphology. Surface Roughness. Mechanical Properties. Macrostress. Effect
of Substrate Bias. Thermal Stability. Oxidation Resistance. High
Si-containing W-Si-N Nanocomposite Films. Deposition Rate. Elemental
Composition. Chemical Bonding and Phase Composition. Structure. Morphology.
Surface Roughness. Mechanical Properties. Macrostress. Oxidation
Resistance. Characterization of Thin Films. Mechanical Properties. X-Ray
Diffraction Analysis. Stress Measurement. Film Thickness Measurement.
Scanning Electron Microscopy. Energy Dispersive X-Ray Spectrometry.
Differential Scanning Calorimetry. Thermogravimetric Analysis.
Multilayers and Superlattices. Nanocomposite Films. Thin Film Processing.
Principles of Plasma Discharges. Physical Sputtering and Transport of
Sputtered Material. Sputter Deposition Techniques. Reactive Sputter
Deposition. Film Formation and Structure. Condensation of Sputtered
Material. Interface Formation. Nucleation and Growth. Microstructure of
Thin Films, Structure Zone Models, Advantages and Limitations of Sputter
Deposition Processes. Structure-Property Relation in Hard Films. Me-Si-N
Films With a Low and Intermediate Si Content. Structure, Morphology and
Phase Composition Hardness and Macrostress Oxidation Resistance Problems
with Reproducibility. Novel nanocomposite films - Zr-Si-N Films with a High
Si Content. Deposition Rate. Elemental Composition. Chemical Bonding and
Phase Composition. Electrical and Optical Properties. Structure.
Morphology. Surface Roughness. Mechanical Properties. Macrostress. Effect
of Substrate Bias. Thermal Stability. Oxidation Resistance. High
Si-containing W-Si-N Nanocomposite Films. Deposition Rate. Elemental
Composition. Chemical Bonding and Phase Composition. Structure. Morphology.
Surface Roughness. Mechanical Properties. Macrostress. Oxidation
Resistance. Characterization of Thin Films. Mechanical Properties. X-Ray
Diffraction Analysis. Stress Measurement. Film Thickness Measurement.
Scanning Electron Microscopy. Energy Dispersive X-Ray Spectrometry.
Differential Scanning Calorimetry. Thermogravimetric Analysis.
Synthesis of New Nanostructured Materials. Nanocrystalline Materials.
Multilayers and Superlattices. Nanocomposite Films. Thin Film Processing.
Principles of Plasma Discharges. Physical Sputtering and Transport of
Sputtered Material. Sputter Deposition Techniques. Reactive Sputter
Deposition. Film Formation and Structure. Condensation of Sputtered
Material. Interface Formation. Nucleation and Growth. Microstructure of
Thin Films, Structure Zone Models, Advantages and Limitations of Sputter
Deposition Processes. Structure-Property Relation in Hard Films. Me-Si-N
Films With a Low and Intermediate Si Content. Structure, Morphology and
Phase Composition Hardness and Macrostress Oxidation Resistance Problems
with Reproducibility. Novel nanocomposite films - Zr-Si-N Films with a High
Si Content. Deposition Rate. Elemental Composition. Chemical Bonding and
Phase Composition. Electrical and Optical Properties. Structure.
Morphology. Surface Roughness. Mechanical Properties. Macrostress. Effect
of Substrate Bias. Thermal Stability. Oxidation Resistance. High
Si-containing W-Si-N Nanocomposite Films. Deposition Rate. Elemental
Composition. Chemical Bonding and Phase Composition. Structure. Morphology.
Surface Roughness. Mechanical Properties. Macrostress. Oxidation
Resistance. Characterization of Thin Films. Mechanical Properties. X-Ray
Diffraction Analysis. Stress Measurement. Film Thickness Measurement.
Scanning Electron Microscopy. Energy Dispersive X-Ray Spectrometry.
Differential Scanning Calorimetry. Thermogravimetric Analysis.
Multilayers and Superlattices. Nanocomposite Films. Thin Film Processing.
Principles of Plasma Discharges. Physical Sputtering and Transport of
Sputtered Material. Sputter Deposition Techniques. Reactive Sputter
Deposition. Film Formation and Structure. Condensation of Sputtered
Material. Interface Formation. Nucleation and Growth. Microstructure of
Thin Films, Structure Zone Models, Advantages and Limitations of Sputter
Deposition Processes. Structure-Property Relation in Hard Films. Me-Si-N
Films With a Low and Intermediate Si Content. Structure, Morphology and
Phase Composition Hardness and Macrostress Oxidation Resistance Problems
with Reproducibility. Novel nanocomposite films - Zr-Si-N Films with a High
Si Content. Deposition Rate. Elemental Composition. Chemical Bonding and
Phase Composition. Electrical and Optical Properties. Structure.
Morphology. Surface Roughness. Mechanical Properties. Macrostress. Effect
of Substrate Bias. Thermal Stability. Oxidation Resistance. High
Si-containing W-Si-N Nanocomposite Films. Deposition Rate. Elemental
Composition. Chemical Bonding and Phase Composition. Structure. Morphology.
Surface Roughness. Mechanical Properties. Macrostress. Oxidation
Resistance. Characterization of Thin Films. Mechanical Properties. X-Ray
Diffraction Analysis. Stress Measurement. Film Thickness Measurement.
Scanning Electron Microscopy. Energy Dispersive X-Ray Spectrometry.
Differential Scanning Calorimetry. Thermogravimetric Analysis.