- Comprehensive study of the behavior of oxygen in silicon
- Discusses silicon crystals for VLSI and ULSI applications
- Thorough coverage from crystal growth to device fabrication
- Edited by technical experts in the field
- Written by recognized authorities from industrial and academic institutions
- Useful to graduate students, scientists in other disciplines, and active participants in the arena of silicon-based microelectronics research
- 297 original line drawings
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