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An up-to-date review and summary of this important subfield of applied plasma physics. Concentrating equally on providing a physical understanding of the basic processes involved in plasma electron emission and on the design and applications of plasma cathode electron beam sources, this monograph is of interest to designers of electron sources as well as to scientists and engineers using electron beams in research and industry. It will also be of benefit to both undergraduate and postgraduate students involved in vacuum and plasma electronics, the generation of charged-particle beams, and their applications.…mehr

Produktbeschreibung
An up-to-date review and summary of this important subfield of applied plasma physics. Concentrating equally on providing a physical understanding of the basic processes involved in plasma electron emission and on the design and applications of plasma cathode electron beam sources, this monograph is of interest to designers of electron sources as well as to scientists and engineers using electron beams in research and industry. It will also be of benefit to both undergraduate and postgraduate students involved in vacuum and plasma electronics, the generation of charged-particle beams, and their applications.

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Autorenporträt
Efim Oks is head scientist of the Plasma Sources Department at the High Current Electronics Institute, Russian Academy of Sciences, Russia. His work focuses on the twin areas of plasma cathode electron beam sources and vacuum arc ion beam sources and was awarded prestigiously. Professor Oks has established numerous collaborative scientific research programs with researchers in the United States and Europe. He thus has become a significant international plasma physicist, having authored numerous papers in international journals.