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Volume is indexed by Thomson Reuters CPCI-S (WoS).
These proceedings describe the most recent advances and trends in the fields of dusty and colloidal plasmas: a new discipline which is highly relevant to those working on nanostructured materials, nanotechnologies and devices which are processed using plasma and fusion tools. For instance, in the case of thin-film devices, the production of new materials such as polymorphous or quasi-morphous silicon or even silicon nanotubes is highly dependent upon the production of particles, in the plasma, which are suitable for incorporation into the films produced. Therefore, it is very important to know how dusty and colloidal plasmas behave, and how high-grade electronic films can be processed under such conditions.
These proceedings describe the most recent advances and trends in the fields of dusty and colloidal plasmas: a new discipline which is highly relevant to those working on nanostructured materials, nanotechnologies and devices which are processed using plasma and fusion tools. For instance, in the case of thin-film devices, the production of new materials such as polymorphous or quasi-morphous silicon or even silicon nanotubes is highly dependent upon the production of particles, in the plasma, which are suitable for incorporation into the films produced. Therefore, it is very important to know how dusty and colloidal plasmas behave, and how high-grade electronic films can be processed under such conditions.
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