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The direction of integrated circuit design (ICD) continues to gradually evolve. Focusing on economic rather than technical aspects, this book explains the concept of ICD for manufacturability and its major steps: product definition, design, layout, and manufacturing. Exploring the return-on-investment for ICD for manufacturing, the text presents realistic test cases of product challenges, examines possible solutions, and then demonstrates how to choose and implement the right strategy. The author carefully considers the technical and economical tradeoffs of ICD for manufacturing based on…mehr

Produktbeschreibung
The direction of integrated circuit design (ICD) continues to gradually evolve. Focusing on economic rather than technical aspects, this book explains the concept of ICD for manufacturability and its major steps: product definition, design, layout, and manufacturing. Exploring the return-on-investment for ICD for manufacturing, the text presents realistic test cases of product challenges, examines possible solutions, and then demonstrates how to choose and implement the right strategy. The author carefully considers the technical and economical tradeoffs of ICD for manufacturing based on mature methodologies. He also addresses manufacturing techniques for physical, electrical, and logical design.


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Autorenporträt
Artur Balasinski is a Technology Design Integration Manager for Cypress Semiconductor in San Jose, California. He received the Ph.D.E.E. degree in MOS technology from Warsaw University of Technology, Poland, where he continued as assistant professor. He then joined research team at Yale University, New Haven, CT, to continue - studies on rad-hard devices. Subsequently, he joined the IC industry, first the R&D at STMicroelectronics, working on CMOS process transfers, and since 1997, at Cypress Semiconductor where, as Principal Technology-Design Integration (TDI) engineer, he developed expertise in characterization, process integration, optical proximity correction, and design rules. He has authored or coauthored about 90 papers (3 of them received Best Paper Awards), a book chapter, and has 15 U.S. patents. A member of BACUS Photomask Steering Committee, over the recent years, he attended SPIE, BACUS, VLSI, IEDM conferences where he formulated his views on DfM, as presented in several invited papers and special sessions.