Jiaqi Zhu, Jiecai Han

Infrared Antireflective and Protective Coatings

Mitarbeit:National Defense Industry

• Gebundenes Buch

Produktbeschreibung

This book is a comprehensive introduction on infrared anti-transparent materials and their applications in anti-reflective and protective coatings. Optical, mechanical and thermal properties and preparations of various kinds of films, such as amorphous diamond films, germanium carbide films, boron phosphide films, alumina films and yttrium oxide film are discussed in detail making it suitable for material scientists and industrial engineers.

Produktdetails

• Verlag: De Gruyter
• Seitenzahl: 504
• Erscheinungstermin: 5. März 2018
• Englisch
• Abmessung: 246mm x 175mm x 33mm
• Gewicht: 1043g
• ISBN-13: 9783110488098
• ISBN-10: 3110488094
• Artikelnr.: 48825082

Autorenporträt

Jiaqi Zhu, Jiecai Han, Harbin Institute of Technology, Harbin, China

Inhaltsangabe

Table of Content:
Chapter 1 Foundations of infrared-transparent materials - overview, infrared signal, typical infrared-transparent substrate materials, infrared anti-reflective and protective coatings, optical properties of infrared anti-reflective and protective coatings, mechanical and thermal properties of infrared anti-reflective and protective coatings
Chapter 2 Service environment of infrared anti-reflective and protective coatings - overview, aerodynamic heat/strength environment and failure, typical aerodynamic heat/strength environment and analysis, rain erosion, sand erosion
Chapter 3 Optical design of infrared anti-reflective and protective film system - overview, basic theories of coating design, oblique incidence theory and coating design
Chapter 4 Preparation of infrared anti-reflective and protective coatings - overview, magnetron sputtering, thermal vaporation deposition, plasma enhanced chemical vapor deposition, filtered cathodic vacuum arc deposition, large area filtered cathodic vacuum arc uniform position, large plane uniform magnetron sputtering, heavy caliber spherical uniform magnetron suttering
Chapter 5 Amorphous diamond films - overview, determination of energy of rich sp3 hybrid, deposition mechanism of amorphous diamond films, process control rules of optical parameters of thin film, effect on film thickness and stress, thermal stability, combined with infrared window materials, structure and stress analysis of multilayer amorphous diamond films, mechanical properties of multilayer amorphous diamond films
Chapter 6 Germanium carbide film - overview, deposition of germanium carbide file prepared by magnetron co-sputtering, surface morphology, crystal structure and composition, bonding structure and mechanism, film density, optical properties of thin films, electrical properties of thin films, mechanical properties of thin films, thermal stability, Germanium carbide composite films
Chapter 7 Boron phosphide film - overview, progress of structure and properties of boron phosphide film, structure analysis of boron phosphide film by reactive magnetron sputtering, thermal stability of boron phosphide film, mechanical and optical properties of boron phosphide film, corrosion resistance and wear resistance of boron phosphide film
Chapter 8 Alumina film - overview, research updates, preparation of alumina film, growth rate, composition and chemical bonding, morphology and structure analysis, low temperature crystallization by anti-sputtering assisted deposition
Chapter 9 Yttrium oxide film - overview, crystal structure control of yttrium oxide film prepared by reactive magnetron sputtering, performance control of yttrium oxide film, growth pattern and deposition rate of yttrium oxide film, the combination of yttrium oxide film and zinc sulfide substrate
Chapter 10 Infrared transparent conductive oxide thin film - overview, preparation of In2O3 and In2O3:Sn film by plasma bombardment magnetron sputtering, structure and performance of n-type ruthenium doped yttrium oxide film prepared by magnetron co-sputtering, mechanical analysis and application of infrared transparent conduction