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Germanium is gaining interest in the semiconductorindustry as a replacement channel material for highmobility applications. Contamination directlyaffects the device performance, yield andreliability. Therefore, continued device scaling isdependent on effective surface preparation includingeffective contamination and particle removal ofgermanium surface. Cleaning and preparation methodsfor silicon surface have been extensively developedover the past few decades. Germanium surfacecleaning and preparation is at its infancy and ismarkedly different from that of silicon. This bookexamines these differences and fundamentals involvedin germanium surface cleaning. This book alsoproposes methods for basic germanium surfacecleaning and the basis for further processdevelopment for professionals involved in surfacecleaning of semiconductor materials.