M. Sugawara

Plasma Etching

Fundamentals and Applications

• Gebundenes Buch

Produktbeschreibung

This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

Produktdetails

• Verlag: Sydney University Press
• Seitenzahl: 356
• Erscheinungstermin: 30. Juli 1998
• Englisch
• Abmessung: 245mm x 164mm x 24mm
• Gewicht: 747g
• ISBN-13: 9780198562870
• ISBN-10: 019856287X
• Artikelnr.: 22381596

Autorenporträt

Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: [phone]

Inhaltsangabe

1: Introduction
2: RF discharges
3: Physical basis of plasma etching process
4: Diagnostics of plasma particles and potentials
5: Technology of reactive ion etching
6: Magnetic field coupled etchers
7: ECR plasma etchers
8: Future propects
Index